椭偏仪 Ellipsometer
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17/人使用者
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118/次机时次数
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515.7/小时总时长
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65/次送样次数
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41/人收藏者
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收费标准
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设备型号
J.A.Woollam RC2 -
当前状态
-
管理员
孙成军 Chengjun SUN -
放置地点
W2-129
- 仪器信息
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名称
椭偏仪 Ellipsometer
资产编号
MC-MS-0004
型号
J.A.Woollam RC2
规格
193-1690nm
产地
美国
厂家
J.A.Woollam
所属品牌
J.A.Woollam
出产日期
购买日期
所属单位
材料表征与制备中央实验室 Materials Characterization and Preparation Facility (GZ)
使用性质
科研
所属分类
MCPF-分子结构分析 Molecular Structure Analysis
资产负责人
孙成军 Chengjun SUN
联系电话
联系邮箱
chengjunsun@hkust-gz.edu.cn
放置地点
W2-129
- 主要规格&技术指标
- 主要功能及特色
主要规格&技术指标
1.光谱范围193-1690nm;
2.自动变角基座：45-90°；
3.Z轴：自动移动，最大行程18mm，最小步长1um；
4.光斑尺寸：普通光斑4mm直径，微光斑300um直径；
5.测量参数包括：分光椭偏Ψ和Δ；透射及反射强度百分比；退偏振百分比；广义椭偏；穆勒矩阵；
6.全穆勒矩阵测量达到0.3秒；
7：测试准确性：Psi 45°±0.02°，Delta 0°±0.05°,Depolarization 0%±0.5%，15 normalized Muller-Matrix elements, Diagonal 1±0.002，Off-Diagonal 0±0.002.
1.Wide spectral range 193~1690nm;
2.Automatic angle-changing base:45-90°;
3.Z axis: automatic movement, maximum stroke 18mm, minimum step size 1um;
4.Spot size: normal spot 4mm in diameter, micro spot 300um in diameter;
5.Measurement parameters include: spectral ellipsometry Ψ and Δ; percentage of transmitted and reflected intensity; percentage of depolarization; generalized ellipsometry; Muller matrix;
6.Full Mueller matrix measurement up to 0.3 seconds;
7.test accuracy:Psi 45°±0.02°，Delta 0°±0.05°,Depolarization 0%±0.5%，15 normalized Muller-Matrix elements, Diagonal 1±0.002，Off-Diagonal 0±0.002.
2.自动变角基座：45-90°；
3.Z轴：自动移动，最大行程18mm，最小步长1um；
4.光斑尺寸：普通光斑4mm直径，微光斑300um直径；
5.测量参数包括：分光椭偏Ψ和Δ；透射及反射强度百分比；退偏振百分比；广义椭偏；穆勒矩阵；
6.全穆勒矩阵测量达到0.3秒；
7：测试准确性：Psi 45°±0.02°，Delta 0°±0.05°,Depolarization 0%±0.5%，15 normalized Muller-Matrix elements, Diagonal 1±0.002，Off-Diagonal 0±0.002.
1.Wide spectral range 193~1690nm;
2.Automatic angle-changing base:45-90°;
3.Z axis: automatic movement, maximum stroke 18mm, minimum step size 1um;
4.Spot size: normal spot 4mm in diameter, micro spot 300um in diameter;
5.Measurement parameters include: spectral ellipsometry Ψ and Δ; percentage of transmitted and reflected intensity; percentage of depolarization; generalized ellipsometry; Muller matrix;
6.Full Mueller matrix measurement up to 0.3 seconds;
7.test accuracy:Psi 45°±0.02°，Delta 0°±0.05°,Depolarization 0%±0.5%，15 normalized Muller-Matrix elements, Diagonal 1±0.002，Off-Diagonal 0±0.002.
主要功能及特色
1、宽的光谱范围，覆盖深紫外到近红外193-1690nm;
2、能够采集穆勒矩阵全部16个元;
3、配备聚焦件可测量微小样品；
4、测试准确性高，重复性好；
5、软件材料库全、色散模型多，功能齐全;
6、通过测量偏振光经过样品表面反射后偏振态的改变，基于光学模型的数据分析，可获得薄膜厚度和光学常数等参数； 7、自动样品台可实现Mapping功能
1、Wide spectral range covered wavelengths from the ultraviolet to the extended near infrared 193~1690nm;
2.the first commercial spectroscopic ellipsometer to collect all 16 elements of the Muller matrix ;
3. Small samples can be measured with focusing element;
4 superior data accuracy and high repeatability;
5.complete material library and dispersion models;
6.Ellipsometry uses polarized light to characterize thin film and bulk materials. a change in polarization is measured after reflecting light from the surface. Thin film thickness and optical constants are derived from the measurement; 7. Map thin film uniformity of wafers or glass pannels using the automatic sample stage.
2、能够采集穆勒矩阵全部16个元;
3、配备聚焦件可测量微小样品；
4、测试准确性高，重复性好；
5、软件材料库全、色散模型多，功能齐全;
6、通过测量偏振光经过样品表面反射后偏振态的改变，基于光学模型的数据分析，可获得薄膜厚度和光学常数等参数； 7、自动样品台可实现Mapping功能
1、Wide spectral range covered wavelengths from the ultraviolet to the extended near infrared 193~1690nm;
2.the first commercial spectroscopic ellipsometer to collect all 16 elements of the Muller matrix ;
3. Small samples can be measured with focusing element;
4 superior data accuracy and high repeatability;
5.complete material library and dispersion models;
6.Ellipsometry uses polarized light to characterize thin film and bulk materials. a change in polarization is measured after reflecting light from the surface. Thin film thickness and optical constants are derived from the measurement; 7. Map thin film uniformity of wafers or glass pannels using the automatic sample stage.
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公告
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